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Report on the Comparison of Benefits between AutoCAD and AutoCAD LT

Report on the Comparison of Benefits between AutoCAD and AutoCAD LT

Highlights of the productivity survey ★ Using AutoCAD significantly improves productivity in design work compared to AutoCAD LT!

Conducting common design tasks in AutoCAD and AutoCAD LT, comparing productivity and differences. As a result of comparing tasks such as creating geometry, drafting floor plans and elevations, exporting object data, and applying and monitoring CAD standards, it was found that tasks in AutoCAD were completed "up to 7.1 times" faster than in AutoCAD LT.

  • 2D CAD Construction
  • 2D CAD machine
  • Mechanical Design

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Report: Comparison Report on Samsung Memory Cell Processes

Report: Comparison Report on Samsung Memory Cell Processes

This is a report comparing the cell configurations of 20nm class DRAM and 0nm class 2Gb DDR3 DRAM.

This is a reconstruction of the structural analysis of the "Samsung 20nm class 3GB (6x4Gbit) LPDDR3." The main purpose is to compare the cell configurations of the 20nm class DRAM with its predecessor, the 30nm class 2Gb DDR3 DRAM (the 20nm class is simply designated as "2X nm"). 【Features】 ■ Chip using six 2X nm class 4GB ■ Symmetrical configuration of two sets of three chip stacks within one package ■ Package thickness: 0.8mm with six die configuration For more details, please download the catalog or contact us.

  • Analysis Services

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Cutting-edge 20nm class logic device process comparison report

Cutting-edge 20nm class logic device process comparison report

Seven cutting-edge logic devices manufactured by Intel, TSMC, and Samsung.

This report is a process comparison of seven advanced 20nm-class logic devices manufactured by Intel, TSMC, and Samsung. It discusses the structures and materials used in the manufacturing of core logic transistors, I/O transistors, metallization, and SRAM layout. [Features] - Understanding key design and manufacturing innovations - Informed decision-making for technology resource investments - Support for IP activities through valuable "Evidence of Use (EoU)" information For more details, please contact us or download the catalog.

  • others

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